Introduction to Metrology Applications in IC Manufacturing

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Introduction to Metrology Applications in IC Manufacturing

Bo Su, Eric Solecky, Alok Vaid, James A. Harrington (editor)
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Metrology has grown significantly, especially in semiconductor manufacturing, and such growth necessitates increased expertise. Until now, this field has never had a book written from the perspective of an engineer in a modern IC manufacturing and development environment. The topics in this Tutorial Text range from metrology at its most basic level to future predictions and challenges, including measurement methods, industrial applications, fundamentals of traditional measurement system characterization and calibration, semiconductor-specific applications, optical metrology measurement techniques, charged particle measurement techniques, x-ray and in situ metrology, hybrid metrology, and mask making. The accompanying CD includes example spreadsheets of measurement uncertainty analysis specifically, precision, matching, and relative accuracy.
年:
2015
版:
1
出版社:
SPIE Press
言語:
english
ページ:
184
ISBN 10:
1628418117
ISBN 13:
9781628418118
シリーズ:
Tutorial Texts
ファイル:
PDF, 28.42 MB
IPFS:
CID , CID Blake2b
english, 2015
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